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Wafer Level Burn-In

WLBI3810

Wafer Level Burn-in System


Semight WLBI3810 Wafer Level Burn-In System is a high-end burn-in test equipment specifically designed for SiC and GaN wafers, featuring efficient and precise testing capabilities. This system can simultaneously perform High-Temperature Gate Bias (HTGB) and High-Temperature Reverse Bias (HTRB) burn-in tests on 9 wafers, with a testing time range from several minutes to thousands of hours, flexibly adapting to the burn-in requirements of different products. This equipment features a fully automated loading and unloading system, incorporates a three-cassette design, supports seamless test mode switching, and automatically adjusts burn-in conditions, ensuring both efficiency and continuity throughout the testing process.

The system is capable of high-precision detection of the threshold voltage (Vth) for each die, ensuring the accuracy of test data. Each test channel is equipped with an independent over-current protection function, effectively safeguarding the safety of the devices under test. Additionally, the system can generate detailed map data, providing users with comprehensive performance analysis and quality control references. The WLBI3810 system provides reliable solutions for diverse testing needs, from stable burn-in tests in large-scale batch production to flexible configuration in R&D.

Features

  • Automated Loading and Unloading

    Fully automated wafer handling minimizes manual intervention, boosting efficiency and accuracy
  • Precise Probing

    Delivers ±10μm probe mark repositioning accuracy for reliable testing
  • Comprehensive System Features

    Supports map data binding for traceability and testing up to 4224 dies simultaneously
  • Multimode Burn-in

    Automatically switches between HTGB and HTRB modes
  • Leakage Current Monitoring

    Igss and Idss leakage current moitoring
  • Integrated Testing Functions

    Includes Vth parameter testing for in-depth analysis
  • Exceptional Measurement Accuracy

    Offers maximum resolution of 0.1nA
    Maximum leakage current accuracy 0.5nA
  • Precise Temperature Control

    Ensures uniformity within ±3℃, accuracy within 1℃, and resolution of 0.1℃

Functions and Advantages

  • System Configuration

    The system accommodates up to nine burn-in stations, each dedicated to a single wafer and independently controlled. This design enables multiple stations to operate in different modes simultaneously, and supports various burn-in verifications by running the burn-in plan.





The specific configuration is as follows:

No.

Module

Part Number

Description

1

System Cabinet

WLBI3810-M

Includes system frame, electric cabinet, and loading/unloading machine

Supports fully automated wafer loading and unloading

Achieves probe mark repositioning accuracy of ±10μm

Supports map data binding with traceable data

Automatically switches between HTGB and HTRB modes

Test Igss and Idss leakage

Integrates Vth parameter testing

Offers flexible configuration of burn-in plans

Supports SECS/GEM communication interface

Software supports local data and database uploads, and EAP integration

Supports CP map data import

Supports online editing of test recipes

Software supports three-level permission management and multi-account management

Note: HTGB + HTRB: Fully equipped with 9 stations

2

Burn-in Layer

WLBI3810-L

High precision leakage current test, the highest precision leakage current  resolution can be 0.1nA.

Supports nitrogen protection to prevent high-voltage arcing and pad oxidation.

Temperature uniformity ≤±3℃, accuracy ≤1℃, resolution 0.1℃.

High-density probe card and support for high-voltage chuck.

High-precision and high-reliability heating and temperature control system.

Compatible with 6- and 8-inch wafers.

Full Touch: Burn-in all Dies at once, up to 4224 Dies.

One year of free maintenance.

Note: HTGB + HTRB:  Fully equipped with 9 stations.

3

Burn-in Fixture

WLBI3810-F

Designed for SiC wafer burn in: HTGB + HTRB

Supports 6- and 8-inch wafers

Supports up to 4224 dies




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Details
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